公开(公告)号：US11796921B2

公开(公告)日：2023-10-24

申请号：US17427412

申请日：2020-01-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Arend Johannes Donkerbroek ,  Yassin Chowdhury ,  Maurice Henricus Franciscus Janssen

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/7055 ,  G03F7/70591

Abstract: A lithographic apparatus including a projection system having an optical axis and configured to project a radiation beam. The apparatus includes a measurement unit arranged to measure the radiation beam projected by the projection system, the measurement unit having an opening through which the radiation beam passes in use, and a sensing surface extending transverse to the optical axis and arranged to measure the radiation beam passing through the opening. The apparatus is configured to move the sensing surface in a plane transverse to the optical axis between a plurality of measurement positions. The radiation beam defines a view in the plane, and the measurement unit is configured such that the sensing surface captures, in each measurement position, a portion of the view smaller than 100% of the view.