公开(公告)号：US11187994B2

公开(公告)日：2021-11-30

申请号：US17264023

申请日：2019-07-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Mohammad Reza Kamali ,  Brennan Peterson

IPC: G03F7/20

Abstract: A method for controlling a manufacturing process for manufacturing semiconductor devices, the method including: obtaining performance data indicative of the performance of the manufacturing process, the performance data including values for a performance parameter across a substrate subject to the manufacturing process; and determining a process correction for the manufacturing process based on the performance data and at least one control characteristic related to a dynamic behavior of one or more control parameters of the manufacturing process, wherein the determining is further based on an expected stability of the manufacturing process when applying the process correction.

公开(公告)号：US11009803B2

公开(公告)日：2021-05-18

申请号：US16587483

申请日：2019-09-30

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Matthias Kruizinga ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Erik Willem Bogaart ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Richard Joseph Bruls ,  Jeroen Dekkers ,  Paul Janssen ,  Mohammad Reza Kamali ,  Ronald Harm Gunther Kramer ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Matthew Lipson ,  Erik Roelof Loopstra ,  Joseph H. Lyons ,  Stephen Roux ,  Gerrit Van Den Bosch ,  Sander Van Den Heijkant ,  Sandra Van Der Graaf ,  Frits Van Der Meulen ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge

IPC: G03F1/64 ,  G03F7/20

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US10558129B2

公开(公告)日：2020-02-11

申请号：US15526654

申请日：2015-11-16

Applicant: ASML Netherlands B.V.

Inventor： Matthias Kruizinga ,  Maarten Mathijs Marinus Jansen ,  Jorge Manuel Azeredo Lima ,  Erik Willem Bogaart ,  Derk Servatius Gertruda Brouns ,  Marc Bruijn ,  Richard Joseph Bruls ,  Jeroen Dekkers ,  Paul Janssen ,  Mohammad Reza Kamali ,  Ronald Harm Gunther Kramer ,  Robert Gabriël Maria Lansbergen ,  Martinus Hendrikus Antonius Leenders ,  Matthew Lipson ,  Erik Roelof Loopstra ,  Joseph H. Lyons ,  Stephen Roux ,  Gerrit Van Den Bosch ,  Sander Van Den Heijkant ,  Sandra Van Der Graaf ,  Frits Van Der Meulen ,  Jérôme François Sylvain Virgile Van Loo ,  Beatrijs Louise Marie-Joseph Katrien Verbrugge

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/22

Abstract: A mask assembly suitable for use in a lithographic process, the mask assembly comprising a patterning device; and a pellicle frame configured to support a pellicle and mounted on the patterning device with a mount; wherein the mount is configured to suspend the pellicle frame relative to the patterning device such that there is a gap between the pellicle frame and the patterning device; and wherein the mount provides a releasably engageable attachment between the patterning device and the pellicle frame.

公开(公告)号：US11036128B2

公开(公告)日：2021-06-15

申请号：US16060837

申请日：2016-12-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Derk Servatius Gertruda Brouns ,  Paul Janssen ,  Mohammad Reza Kamali ,  Mária Péter ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  David Ferdinand Vles ,  Willem-Pieter Voorthuijzen

IPC: G03F1/64 ,  G03F1/66 ,  G03F7/20

Abstract: A membrane assembly for EUV lithography, the membrane assembly including: a planar membrane; a border configured to hold the membrane; and a frame assembly connected to the border and configured to attach to a patterning device for EUV lithography, wherein the frame assembly is connected to the border in a direction perpendicular to the plane of the membrane such that in use the frame assembly is between the border and the patterning device.