公开(公告)号：US20190179230A1

公开(公告)日：2019-06-13

申请号：US16309490

申请日：2017-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Pascal Jean Henri BLOEMEN ,  Petrus Theodorus JUTTE ,  Arnoldus Johannes Martinus Jozeph RAS ,  Miao YU

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70775 ,  G03F7/7085 ,  G03F7/70916

Abstract: An inspection substrate for inspecting a component of an apparatus for processing production substrates, the inspection substrate has: a body having dimensions similar to the production substrates so that the inspection substrate is compatible with the apparatus; an illumination device embedded in the body, the illumination device configured to emit radiation toward a target area of the component of the apparatus; an imaging device embedded in the body, the imaging device configured to detect radiation scattered at the target area and generate an image from the detected radiation, wherein the illumination device is configured to emit the radiation such that radiation that is specularly reflected at the target area does not contribute to the image generated by the imaging device.