公开(公告)号：US20220155694A1

公开(公告)日：2022-05-19

申请号：US17438994

申请日：2020-02-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul Jonathan TURNER ,  Anagnostis TSIATMAS

IPC: G03F7/20

Abstract: A method, computer program and associated apparatuses for metrology. The method includes determining whether a substrate or substrate portion is subject to a process effect. The method includes: obtaining inspection data including a plurality of sets of measurement data associated with a structure on the substrate or portion thereof (for example measurement pupils); and obtaining fingerprint data describing a spatial variation of a parameter of interest. An iterative mapping of the inspection data to the fingerprint data is performed. Whether the structure is subject to a process effect is based on a degree to which the iterative mapping converges on a solution.