公开(公告)号：US20240045346A1

公开(公告)日：2024-02-08

申请号：US18266361

申请日：2021-12-09

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Pedro Julian RIZO DIAGO ,  George Grigorievich VOEVODKIN ,  Earl William EBERT

IPC: G03F7/00

CPC classification number: G03F7/70925 ,  G03F7/70741

Abstract: A reticle stage cleaning apparatus for a reticle stage in a lithographic apparatus includes a substrate having a frontside and a backside opposite the frontside and a conductive layer disposed on the frontside of the substrate. The conductive layer is configured to contact the reticle stage to dissipate charge on the reticle stage and to remove particles on the reticle stage via an electrostatic field generated between the conductive layer and the reticle stage. The substrate can include a plurality of grooves and the conductive layer can be disposed on the frontside of the substrate and on a bottom surface of the plurality of grooves. The reticle stage cleaning apparatus can include a second conductive layer configured to remove particles on the reticle stage via a second electrostatic field and be disposed atop the conductive layer in the bottom surface of the plurality of grooves.

公开(公告)号：US20160033860A1

公开(公告)日：2016-02-04

申请号：US14775249

申请日：2014-03-04

Applicant: ASML NETHERLANDS B.V.

Inventor： James Norman WILEY ,  Juan Diego ARIAS ESPINOZA ,  Derk Servatius Gertruda BROUNS ,  Laurentius Cornelius DE WINTER ,  Florian Didier Albin DHALLUIN ,  Pedro Julian RIZO DIAGO ,  Luigi SCACCABAROZZI

IPC: G03F1/64

CPC classification number: G03F1/64 ,  G03F1/62 ,  G03F7/70908 ,  G03F7/70983

Abstract: The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle.

Abstract translation: 本发明涉及用于屏蔽用于EUV光刻的掩模版的装置。 该装置包括防护薄膜组件和至少一个与防护薄膜组件连通的致动器，所述致动器构造成在使用中诱导防护薄膜相对于掩模版的运动。