公开(公告)号：US20240411232A1

公开(公告)日：2024-12-12

申请号：US18718009

申请日：2022-11-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Jingshi LI ,  Po-Ju CHEN

IPC: G03F7/00 ,  G03F7/20

Abstract: Method for calculating a reparation dose for a die of a substrate, the method including: a) obtaining a function of a distribution of an energy dose applied to the die over time based on a measurement of exposure energy, b) determining energy dose in a timeslot with a reparation point in the centre of the timeslot, c) calculating a slope of the function in the timeslot to determine at least one measurement point, the at least one measurement point being positioned within the timeslot based on the slope of the function in the timeslot; d) calculating a reparation dose at the measurement point; e) calculating a repair energy based on the reparation dose; f) updating the function over the timeslot based on applying the repair energy at the reparation point.