公开(公告)号：US20160274467A1

公开(公告)日：2016-09-22

申请号：US14442415

申请日：2013-10-23

申请人： ASML NETHERLANDS B.V.

发明人： Hendrikus Gijsbertus SCHIMMEL ,  Michel RIEPEN ,  Reinier Theodorus Martinus JULISEN ,  Dennis DE GRAAF

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70058 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A radiation source suitable for providing radiation to a lithographic apparatus generates radiation from a plasma (12) generated from a fuel (31) within an enclosure comprising a gas. The plasma generates primary fuel debris collected as a fuel layer on a debris-receiving surface ((33a), (33b)). The debris-receiving surface is heated to a temperature to maintain the fuel layer as a liquid, and to provide a reduced or zero rate of formation gas bubbles within the liquid fuel layer in order to reduce contamination of optical surfaces (14) by secondary debris arising from gas bubble eruption from the liquid fuel layer. Additionally or alternatively, the radiation source may have a debris receiving surface positioned and/or oriented such that substantially all lines normal to the debris receiving surface do not intersect an optically active surface of the radiation source.

摘要翻译： 适于向光刻设备提供辐射的辐射源产生从包括气体的外壳内的燃料（31）产生的等离子体（12）的辐射。 等离子体产生作为燃料层收集的碎屑接收表面（（33a），（33b））上的主要燃料碎片。 碎片接收表面被加热到一个温度以将燃料层保持为液体，并且在液体燃料层内提供降低或零速率的地层气泡，以便减少光学表面（14）由二次碎屑的污染 来自液体燃料层的气泡喷发。 附加地或替代地，辐射源可以具有定位和/或定向的碎片接收表面，使得基本上所有垂直于碎片接收表面的线不与辐射源的光学活性表面相交。