公开(公告)号：US20200150545A1

公开(公告)日：2020-05-14

申请号：US16604324

申请日：2018-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Giovanni Luca GATTOBIGIO ,  Nirupam BANERJEE ,  Johan Franciscus Maria BECKERS ,  Erik Henricus Egidius Catharina EUMMELEN ,  Ronald Frank KOX ,  Theodoras Wilhelmus POLET ,  Cornelius Maria ROPS ,  Mike Paulus Johannes VAN GILS ,  Wouterus Jozephus Johannes VAN SLUISVELD ,  Rik VANGHELUWE

IPC: G03F7/20

Abstract: A method of performance testing working parameters of a fluid handing structure in an immersion lithographic apparatus, the method including: placing a test substrate having an upper surface with a first portion with a resist defining the upper surface and a second portion with a material different from the resist defining the rest of the upper surface on a table in the immersion lithographic apparatus, confining liquid on a region of an upper surface of the table and/or the upper surface of the test substrate by operating the fluid handing structure using the associated working parameters, moving the table such that the region moves from the second portion to the first portion, and detecting change to and/or residue on the first portion as a result of liquid being left behind on the first portion during the moving.