公开(公告)号：US20160103399A1

公开(公告)日：2016-04-14

申请号：US14975513

申请日：2015-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik DE Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

Abstract translation: 浸没式光刻设备具有通过防止气泡从间隙中流入光束路径和/或提取可能在间隙中形成的气泡的方法来适应防止或减少衬底台中的一个或多个间隙中的气泡形成。