公开(公告)号：US20190285990A1

公开(公告)日：2019-09-19

申请号：US16277120

申请日：2019-02-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Rogier Hendrikus Magdelena Cortie ,  Paulus Martinus Maria Liebregts ,  Michel Riepen ,  Fabrizio Evangelista

IPC: G03F7/20

Abstract: A fluid handling structure for a lithographic apparatus is disclosed, the fluid handling structure successively has, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: an elongate opening or a plurality of openings arranged in a first line that, in use, are directed towards a substrate and/or a substrate table configured to support the substrate; a gas knife device having an elongate aperture in a second line; and an elongate opening or a plurality of openings adjacent the gas knife device.