公开(公告)号：US11506566B2

公开(公告)日：2022-11-22

申请号：US16214196

申请日：2018-12-10

Applicant: ASML NETHERLANDS B.V.

Inventor： Mariya Vyacheslavivna Medvedyeva ,  Maria Isabel De La Fuente Valentin ,  Satej Subhash Khedekar ,  Bert Verstraeten ,  Bastiaan Onne Fagginer Auer

IPC: G01C25/00 ,  G01M11/02 ,  G03F7/20 ,  G01B11/00

Abstract: Methods for processing data from a metrology process and for obtaining calibration data are disclosed. In one arrangement, measurement data is obtained from a metrology process. The metrology process includes illuminating a target on a substrate with measurement radiation and detecting radiation redirected by the target. The measurement data includes at least a component of a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method further includes analyzing the at least a component of the detected pupil representation to determine either or both of a position property and a focus property of a radiation spot of the measurement radiation relative to the target.