公开(公告)号：US20250068085A1

公开(公告)日：2025-02-27

申请号：US18727740

申请日：2023-01-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs KRAMER ,  Christianus Wilhelmus Johannes BERENDSEN ,  Stijn VAN PELT ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Simon Karel RAVENSBERGEN ,  Erik Willem BOGAART

IPC: G03F7/00

Abstract: A substrate table, for use in an immersion lithographic apparatus, having a support area defining a support plane to support a substrate to be patterned and an upper surface surrounding the support area, wherein: the upper surface has an outer region that is substantially planar and a transition region proximate the support area; and the transition region is not co-planar with the outer region so as to ameliorate a level transition between the outer region and a non-standard substrate, which has a thickness different than a distance between the support plane and a nominal plane defined by the outer region.