公开(公告)号：US11199782B2

公开(公告)日：2021-12-14

申请号：US16468304

申请日：2017-11-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo Tel ,  Hans Erik Kattouw ,  Valerio Altini ,  Bearrach Moest

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.

公开(公告)号：US11599027B2

公开(公告)日：2023-03-07

申请号：US17520803

申请日：2021-11-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo Tel ,  Hans Erik Kattouw ,  Valerio Altini ,  Bearrach Moest

IPC: G03F7/20 ,  G03F9/00

Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.

公开(公告)号：US11360395B2

公开(公告)日：2022-06-14

申请号：US16978445

申请日：2019-02-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Valerio Altini ,  Frank Staals

IPC: G03F7/20

Abstract: A method for controlling a scanning exposure apparatus configured for scanning an illumination profile over a substrate to form functional areas thereon. The method includes determining a control profile for dynamic control of the illumination profile during exposure of an exposure field including the functional areas, in a scanning exposure operation; and optimizing a quality of exposure of one or more individual functional areas. The optimizing may include a) extending the control profile beyond the extent of the exposure field in the scanning direction; and/or b) applying a deconvolution scheme to the control profile, wherein the structure of the deconvolution scheme is based on a dimension of the illumination profile in the scanning direction.