公开(公告)号：US20240411230A1

公开(公告)日：2024-12-12

申请号：US18700780

申请日：2022-09-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Benjamin Cunnegonda Henricus SMEETS ,  Bram peter Johan LINSSEN ,  Willem Arie ROOS ,  Mark Johannes Hermanus FRENCKEN

IPC: G03F7/00

Abstract: A fluid extraction system for a lithographic apparatus, the fluid extraction system configured to extract fluid that a fluid handling system, including a fluid handling structure, is arranged to supply along a flow path that includes a gap between an edge of a substrate and an edge of a surrounding structure of the substrate; and a controller arranged to control the flow rate of the fluid in the flow path in dependence on one or more selected from: a property of the substrate, a property of the fluid handling system, a property of the fluid handling structure, a property of the fluid extraction system, and/or the separation between the fluid handling structure and the fluid extraction system.