公开(公告)号：US20240377343A1

公开(公告)日：2024-11-14

申请号：US18684558

申请日：2022-08-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Yunbo GUO ,  Zhu WANG ,  Feng YANG ,  Qian ZHAO ,  Mu FENG ,  Jen-Shiang WANG

IPC: G01N23/2251 ,  G06N3/045 ,  G06N3/0475 ,  G06N3/094

Abstract: Described herein is a metrology system and a method for converting metrology data via a trained machine learning (ML) model. The method includes accessing a first (MD1) SEM data set (e.g., images, contours, etc.) acquired by a first scanning electron metrology (SEM) system (TS1) and a second (MD2) SEM data set acquired by a second SEM system (TS2), where the first SEM data set and the second SEM data set being associated with a patterned substrate. Using the first SEM data set and the second SEM data set as training data, a machine learning (ML) model is trained (P303) such that the trained ML model is configured to convert (P307) a metrology data set (310) acquired (P305) by the second SEM system to a converted data set (311) having characteristics comparable to metrology data being acquired by the first SEM system. Furthermore, measurements may be determined based on the converted SEM data.