公开(公告)号：US20250085172A9

公开(公告)日：2025-03-13

申请号：US18286631

申请日：2022-03-29

Applicant: ASML Netherland B.V.

Inventor： Koen Martin Willem Jan BOS ,  Joost André KLUGKIST ,  Anirudh ANAND

IPC: G01K11/12 ,  G03F7/00

Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.

公开(公告)号：US20240201029A1

公开(公告)日：2024-06-20

申请号：US18286631

申请日：2022-03-29

Applicant: ASML Netherland B.V.

Inventor： Koen Martin Willem Jan BOS ,  Joost André KLUGKIST ,  Anirudh ANAND

IPC: G01K11/12 ,  G03F7/00

CPC classification number: G01K11/12 ,  G03F7/7015 ,  G03F7/70316 ,  G03F7/70525 ,  G03F7/7085 ,  G03F7/70891 ,  G03F7/70958

Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.