公开(公告)号：US20200302587A1

公开(公告)日：2020-09-24

申请号：US16895412

申请日：2020-06-08

Applicant: ASML Netherland B.V.

Inventor： Wei FANG ,  Zhao-li Zhang ,  Jack Jau

IPC: G06T7/00 ,  G06K9/46

Abstract: An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.