公开(公告)号：US20220163895A1

公开(公告)日：2022-05-26

申请号：US17441168

申请日：2020-02-20

Applicant: ASML Netherlands B,V.

Inventor： Oscar Franciscus Jozephus NOORDMAN ,  Antonius Theodorus Wilhelmu KEMPEN ,  Jan Bernard Plechelmus VAN SCHOOT ,  Marinus Aart VAN DEN BRINK

IPC: G03F7/20

Abstract: A lithographic system comprises a radiation source and a lithographic apparatus. The radiation source provides radiation to the lithographic apparatus. The lithographic apparatus uses the radiation for imaging a pattern onto multiple target areas on a layer of photo-resist on a semiconductor substrate. The imaging requires a pre-determined dose of radiation. The system is controlled so as to set a level of a power of the radiation in dependence on a magnitude of the pre-determined dose.