公开(公告)号：US20040160588A1

公开(公告)日：2004-08-19

申请号：US10684826

申请日：2003-10-15

Applicant: ASML Netherlands B. V.

Inventor： Heine Melle Mulder ,  Marco H. P. Moers

IPC: G03B027/54

CPC classification number: G03F7/70941

Abstract: A system and method for determining the stray radiation condition of a projection system, is presented herein. The invention comprises providing a detector with a detector aperture coincident with the image plane of the projection system, and measuring of a reference parameter in accordance with the projection beam intensity. The invention also comprises measuring a stray radiation parameter of an image of an isolated feature, formed by the projection system, and calculating a coefficient representative of the stray radiation condition of the projection system based on the measured stray radiation parameter and the reference parameter. The extent of the detector aperture fits within the extent of a notional shape, which is defined by first scaling down the shape of the feature by the magnification factor of the projection system, and by subsequently displacing each line element constituting the edge of the scaled down shape, parallel to itself, over a distance of at least null/NA in a direction perpendicular to that line element. The invention further comprises positioning the detector aperture within the image of the isolated feature.

Abstract translation: 本文提出了一种用于确定投影系统的杂散辐射条件的系统和方法。 本发明包括提供具有与投影系统的图像平面重合的检测器孔的检测器，以及根据投影束强度测量参考参数。 本发明还包括测量由投影系统形成的孤立特征的图像的杂散辐射参数，并且基于测量的杂散辐射参数和参考参数来计算代表投影系统的杂散辐射条件的系数。 检测器孔的范围适合于通过首先按照投影系统的放大系数缩小特征的形状，并且随后将构成缩小的边缘的每个线元素移位的概念形状的范围 形状，平行于其自身，在垂直于该线元件的方向上至少为λ/ NA的距离。 本发明还包括将检测器孔定位在隔离特征的图像内。