公开(公告)号：US20160154322A1

公开(公告)日：2016-06-02

申请号：US15003768

申请日：2016-01-21

Applicant: ASML Netherlands B. V.

Inventor： Yang-Shan Huang ,  Theodorus Petrus Maria Cadee

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

Abstract: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table constructed to hold a substrate and a positioning device for in use positioning the substrate table relative to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted to the substrate table and a second positioning member co-operating with the first positioning member to position the substrate table. The second positioning member is mounted to a support structure. The substrate stage further comprises an actuator that is arranged to exert a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.