公开(公告)号：US20250036031A1

公开(公告)日：2025-01-30

申请号：US18716007

申请日：2022-11-17

Applicant: ASML Netherlands B.V.

Inventor： Aniruddha Ramakrishna SONDE ,  Mahesh Upendra AJGAONKAR ,  Krishanu SHOME ,  Simon Reinald HUISMAN ,  Sebastianus Adrianus GOORDEN ,  Franciscus Godefridus Casper BIJNEN ,  Patrick WARNAAR ,  Sergei SOKOLOV

IPC: G03F7/00 ,  G01B11/27

Abstract: Some embodiments of this disclosure can improve measurement of target mark asymmetry in metrology apparatuses for improving accuracy in measurements performed in conjunction with lithographic processes. For example, a metrology system can include a projection system configured to receive a plurality of diffraction orders diffracted from a target on a substrate. The metrology system can further include a detector array and a waveguide device configured to transmit the plurality of diffraction orders between the projection system and the detector array. The detector array can be configured to detect each of the plurality of diffraction orders spatially separate from other ones of the plurality of diffraction orders.