公开(公告)号：US12044951B2

公开(公告)日：2024-07-23

申请号：US17769725

申请日：2020-10-07

Applicant: ASML Netherlands B.V.

Inventor： Wenjie Jin ,  Nan Lin ,  Christina Lynn Porter ,  Petrus Wilhelmus Smorenburg

IPC: G02F1/355 ,  G02F1/35 ,  G03F7/00

CPC classification number: G02F1/354 ,  G02F1/355 ,  G03F7/70033 ,  G03F7/706847

Abstract: Disclosed is an illumination source comprising a gas delivery system comprising a gas nozzle. The gas nozzle comprises an opening in an exit plane of the gas nozzle. The gas delivery system is configured to provide a gas flow from the opening for generating an emitted radiation at an interaction region. The illumination source is configured to receive a pump radiation having a propagation direction and to provide the pump radiation in the gas flow. A geometry shape of the gas nozzle is adapted to shape a profile of the gas flow such that gas density of the gas flow first increases to a maximum value and subsequently falls sharply in a cut-off region along the propagation direction.