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公开(公告)号:US20180299796A1
公开(公告)日:2018-10-18
申请号:US15570934
申请日:2016-03-29
Applicant: ASML Netherlands B.V.
Inventor: Günes NAKIBOGLU , Maarten HOLTRUST , Martinus VAN DUIJNHOVEN , Francis FAHRNI , Frank Johannes Jacobus VAN BOXTEL , Anne Willemijn Bertine QUIST , Bart Dinand PAARHUIS , Daan Daniel Johannes VAN SOMMEREN
IPC: G03F7/20
Abstract: A lithographic apparatus has: a conduit through which a gas can flow; a gas mover configured to cause the gas to flow in the conduit; a wall in contact with the gas in the conduit and defining a membrane aperture therein; and an acoustic filter including a flexible membrane fixed in the membrane aperture. The acoustic filter reduces transmission of acoustic disturbances without adding any flow resistance.