公开(公告)号：US11181833B2

公开(公告)日：2021-11-23

申请号：US16442953

申请日：2019-06-17

Applicant: ASML Netherlands B.V.

Inventor： Jerry Johannes Martinus Peijster ,  Diederik Geert Femme Verbeek

IPC: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/02 ,  H01J37/317

Abstract: Support arrangement for supporting a radiation projection system in a substrate processing apparatus, the support arrangement comprising: a support body for supporting the radiation projection system; electrical wiring for supplying voltages to components within the radiation projection system and/or for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system; optical fibers, for supplying control data for modulation of radiation to be projected onto a target surface by the radiation projection system, and a cooling arrangement comprising one or more fluid conduits for cooling the radiation projection system; the electrical wiring, the optical fibers, and the cooling arrangement being at least partly accommodated in and/or supported by the support body.