公开(公告)号：US20170176328A1

公开(公告)日：2017-06-22

申请号：US15378962

申请日：2016-12-14

Applicant: ASML Netherlands B.V.

Inventor： Martin Jacobus Johan JAK ,  Armand Eugene Albert KOOLEN ,  Gerbrand VAN DER ZOUW ,  Dirk Karel Margaretha BRODDIN

IPC: G01N21/47 ,  G03F7/20 ,  G01N21/95

Abstract: An inspection apparatus includes an optical system, which has a radiation beam delivery system for delivering radiation to a target, and a radiation beam collection system for collecting radiation after scattering from the target. Both the delivery system and the collection system comprise optical components that control the characteristics of the radiation and the collected radiation. By controlling the characteristics of one or both of the radiation and collected radiation, the depth of focus of the optical system may be increased.