公开(公告)号：US20190294057A1

公开(公告)日：2019-09-26

申请号：US16304474

申请日：2017-05-05

Applicant: ASML Netherlands B.V.

Inventor： Hendrikus Herman Marie Cox ,  Ronald Cornelis Gerardus Gijzen ,  Patrick Willem Paul Limpens ,  Bart Friso Riedstra ,  Frits van der Meulen

IPC: G03F7/20 ,  H02K41/03 ,  H02K5/24 ,  H01L21/68

Abstract: The invention pertains to a stage system, and to a lithographic apparatus and a method for manufacturing a device in which a stage system is used.In the stage system a positioning system is provided comprising an actuator adapted to position an object table. The actuator comprises a magnet assembly and a coil assembly.The magnet assembly comprises a first magnetic body and a second magnetic body, which are in use subjected to a internal magnetic force.The magnet assembly has a separate interface for connecting each magnetic body to the object table separately. The magnet assembly further comprises a spacer device, which holds the first and second magnetic body at a relative distance to each other in at least the direction of the internal magnetic force.