公开(公告)号：US20220299889A1

公开(公告)日：2022-09-22

申请号：US17636765

申请日：2020-07-24

Applicant: ASML Netherlands B.V.

Inventor： Thijs Adriaan Cornelis VAN KEULEN ,  Hendrikus COX ,  Ramidin Izair KAMIDI ,  Willem Herman Gertruda Anna KOENEN

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/68

Abstract: A method of determining a desired relative position between a first object of a lithographic apparatus and a second object of the lithographic apparatus. Generating a measurement signal representing a position of the first object relative to the second object, at an initial relative position. Determining a gradient associated with the initial relative position, based on the measurement signal. Determining a position set point based on the gradient and wherein the position set point comprises a three-dimensional dither signal. Controlling the position of the first object relative to the second object to a further relative position, based on the position set point.