公开(公告)号：US20250104210A1

公开(公告)日：2025-03-27

申请号：US18716123

申请日：2022-11-18

Applicant: ASML Netherlands B.V.

Inventor： Lingling PU ,  Hongquan ZUO

IPC: G06T7/00 ,  G06N3/0455

Abstract: Systems and methods for training a machine learning model for defect detection include obtaining training data including an inspection image of a fabricated integrated circuit (IC) and design layout data of the IC, and training a machine learning model using the training data. The machine learning model includes a first autoencoder and a second autoencoder. The first autoencoder includes a first encoder and a first decoder. The second autoencoder includes a second encoder and a second decoder. The second decoder is configured to obtain a first code outputted by the first encoder. The first decoder is configured to obtain a second code outputted by the second encoder.