公开(公告)号：US20130201466A1

公开(公告)日：2013-08-08

申请号：US13791477

申请日：2013-03-08

Applicant: ASML Netherlands B.V.

Inventor： Richard Alexander GEORGE ,  Cheng-Qun Gui ,  Pieter Willem Herman De Jager ,  Robbert Edgar Van Leeuwen ,  Jacobus Burghoorn

IPC: G03B27/53

CPC classification number: G03B27/53 ,  G03F7/70291 ,  G03F7/70791 ,  G03F9/7003 ,  G03F9/7026

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

公开(公告)号：US08675175B2

公开(公告)日：2014-03-18

申请号：US13791477

申请日：2013-03-08

Applicant: ASML Netherlands B.V.

Inventor： Richard Alexander George ,  Cheng-Qun Gui ,  Pieter Willem Herman De Jager ,  Robbert Edgar Van Leeuwen ,  Jacobus Burghoorn

IPC: G01B11/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/74

CPC classification number: G03B27/53 ,  G03F7/70291 ,  G03F7/70791 ,  G03F9/7003 ,  G03F9/7026

Abstract: A lithography apparatus includes a projection system configured to project a radiation beam onto a substrate, a detector configured to inspect the substrate, and a substrate table configured to support the substrate and move the substrate relative to the projection system and the detector. The detector is arranged to inspect a portion of the substrate while the substrate is moved and before the portion is exposed to the radiation beam.

Abstract translation: 光刻设备包括投影系统，该投影系统配置成将辐射束投影到基板上，检测器被配置为检查基板;以及基板台，其构造成支撑基板并相对于投影系统和检测器移动基板。 检测器布置成在衬底移动时和在暴露于辐射束之前检查衬底的一部分。