公开(公告)号：US20240324089A1

公开(公告)日：2024-09-26

申请号：US18268122

申请日：2021-11-23

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Jan Otger LUITEN ,  Herman Brian SCHAAP ,  Gerardus, Hubertus Jim FRANSSEN

IPC: H05G2/00

CPC classification number: H05G2/00

Abstract: A method for controlling a density distribution of electrons provided by an electron source for use in hard X-ray, soft X-ray and/or extreme ultraviolet generation, the method comprising generating a plurality of electrons from a pattern of ultracold excited atoms using an ionization laser inside a cavity, wherein the electrons have a density distribution determined by at least one of the patterns of excited atoms and the ionization laser, and accelerating the electrons out of the cavity using a non-static acceleration profile, wherein the acceleration profile controls the density distribution of the electrons as they exit the cavity.