专利检索 ap:("ASML Netherlands B.V.") AND inv:"Johannes Antonius Maria VAN DE WAL" 第 1 页

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发明申请
SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权

公开(公告)号：US20170363964A1

公开(公告)日：2017-12-21

申请号：US15694519

申请日：2017-09-01

申请人： ASML Netherlands B.V.

发明人： Thibault Simon Mathieu LAURENT , Johannes Henricus Wilhelmus JACOBS , Haico Victor KOK , Yuri Johannes Gabriël VAN DE VIJVER , Johannes Antonius Maria VAN DE WAL , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Robbert-Jan VOOGD , Jan Steven Christiaan WESTERLAKEN , Johannes Hubertus Antonius VAN DE RIJDT , Allard Eelco KOOIKER , Wilhelmina Margareta Jozef HURKENS-MERTENS , Yohann Bruno Yvon TEILLET

IPC分类号： G03F7/20

CPC分类号： G03F7/7085 , G03F7/70341 , G03F7/70666 , G03F7/70858 , G03F7/70891

摘要： A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized.