公开(公告)号：US09544983B2

公开(公告)日：2017-01-10

申请号：US14533813

申请日：2014-11-05

Applicant: ASML Netherlands B.V.

Inventor： Chirag Rajyaguru ,  John M. Algots ,  Tetsuya Ishikawa ,  Peter Baumgart

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008

Abstract: An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating.

Abstract translation: 公开了一种EUV光源目标材料处理系统，其包括目标材料分配器和目标材料储存库，其中通过使用感应加热将目标材料储存库中的固体目标材料转化为液体形式的目标材料。