公开(公告)号：US20230096657A1

公开(公告)日：2023-03-30

申请号：US17911398

申请日：2021-02-25

Applicant: ASML Netherlands B.V.

Inventor： Jian ZHANG ,  Yan WANG ,  Liang TANG ,  Yixiang WANG

IPC: H01J37/20 ,  H01J37/244 ,  G01B11/06 ,  H01J37/21 ,  H01J37/22

Abstract: An improved leveling sensor and method for adjusting a sample height in a charged-particle beam inspection system are disclosed. An improved leveling sensor comprises a light source configured to project a first pattern onto a sample and a detector configured to capture an image of a projected pattern after the first pattern is projected on the sample. The first pattern can comprise an irregularity to enable a determination of a vertical displacement of the sample.