公开(公告)号：US20220082947A1

公开(公告)日：2022-03-17

申请号：US17423328

申请日：2019-12-13

Applicant: ASML Netherlands B.V.

Inventor： Marinus Engelbertus Cornelis MUTSAERS ,  Robertus Johannes Marinus DE JONGH ,  Jeroen Pieter STARREVELD

IPC: G03F7/20

Abstract: Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.