公开(公告)号：US20240402617A1

公开(公告)日：2024-12-05

申请号：US18799534

申请日：2024-08-09

Applicant: ASML Netherlands B.V.

Inventor： Spencer ALEXANDER ,  Junru RUAN ,  Haiyan LI ,  Nathan Richard KEECH ,  Huai-Ying CHIN

IPC: G03F7/00

Abstract: In some embodiments, one or more non-transitory, machine-readable medium has instructions thereon, the instructions when executed by a processor being configured to perform operations comprising obtaining scanning electron microscopy (SEM) metrology data for first areas on a training wafer, obtaining optical metrology data for second areas on the training wafer, and training a model, by using the SEM metrology data and the optical metrology data for the training wafer, to generate parameters for features on a production wafer based on optical metrology data for areas of the production wafer.