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公开(公告)号:US20230207259A1
公开(公告)日:2023-06-29
申请号:US18088499
申请日:2022-12-23
Applicant: ASML Netherlands B.V.
Inventor: Erwin SLOT , Niels VERGEER , Vincent Sylvester KUIPER
IPC: H01J37/304 , H01J37/28
CPC classification number: H01J37/3045 , H01J37/28 , H01J2237/1501
Abstract: The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.