公开(公告)号：US20230207259A1

公开(公告)日：2023-06-29

申请号：US18088499

申请日：2022-12-23

Applicant: ASML Netherlands B.V.

Inventor： Erwin SLOT ,  Niels VERGEER ,  Vincent Sylvester KUIPER

IPC: H01J37/304 ,  H01J37/28

CPC classification number: H01J37/3045 ,  H01J37/28 ,  H01J2237/1501

Abstract: The present invention concerns a method of determining alignment of electron optical components in a charged particle apparatus. The charged particle apparatus comprising: an aperture array and a detector configured to detect charged particles corresponding to beamlets that pass through the corresponding apertures in the aperture array. The method comprises: scanning each beamlet in a plane of the aperture array over a portion of the aperture array in which a corresponding aperture of the aperture array is defined so that charged particles of each beamlet may pass through the corresponding aperture; detecting during the scan any charged particles corresponding to each beamlet that passes through the corresponding aperture; generating a detection pixel for each beamlet based on the detection of charged particles corresponding to each beamlet at intervals of the scan; and collecting information comprised in the detection pixel such as the intensity of charged particles.