公开(公告)号：US10222701B2

公开(公告)日：2019-03-05

申请号：US15024815

申请日：2014-09-18

Applicant: ASML Netherlands B.V.

Inventor： Chuangxin Zhao ,  Sander Baltussen ,  Pär Mårten Lukas Broman ,  Richard Joseph Bruls ,  Cristian Bogdan Craus ,  Jan Groenewold ,  Dzmitry Labetski ,  Kerim Nadir ,  Hendrikus Gijsbertus Schimmel ,  Christian Felix Wählisch

IPC: G03B27/42 ,  G03F7/20 ,  H05G2/00

Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.