公开(公告)号：US20190317413A1

公开(公告)日：2019-10-17

申请号：US16379267

申请日：2019-04-09

Applicant: ASML Netherlands B.V.

Inventor： Su-Ting CHENG ,  Sergei Sokolov ,  Armand Eugene Albert Koolen

IPC: G03F7/20 ,  G01B11/26

Abstract: Disclosed is a method of mitigating for a process dependent stray light artifact on a measurement a structure. The method comprises obtaining a calibration scaling factor for the process dependent stray light artifact based on a reference angle resolved measurement and target angle resolved measurement, and a correction of an image with the obtained calibration scaling factor.

公开(公告)号：US20250147437A1

公开(公告)日：2025-05-08

申请号：US18834171

申请日：2023-01-16

Applicant: ASML Netherlands B.V.

Inventor： Armand Eugene Albert KOOLEN ,  Su-Ting CHENG ,  Hugo Augustinus Joseph CRAMER ,  Kirsten Jennifer Lyhn WANG

IPC: G03F7/00 ,  G01B11/27

Abstract: Disclosed is a method of determining a value for a parameter of interest from a target on a substrate. The method comprises obtaining metrology data comprising single-wavelength parameter of interest values which were obtained using a respective different measurement wavelength; and determining said value for the parameter of interest from a stack sensitivity derived weighted combination of said single-wavelength parameter of interest values. Also disclosed is a method of selecting wavelengths for a measurement based on at least the derivative of the stack sensitivity with respect to wavelength.