公开(公告)号：US20210066877A1

公开(公告)日：2021-03-04

申请号：US16969071

申请日：2019-01-24

Applicant: ASML Netherlands B.V.

Inventor： Szymon Dominik SMOLAREK

IPC: H01S3/00 ,  G01B7/004 ,  G03F7/20 ,  H05G2/00 ,  G01K7/16 ,  H01S3/223

Abstract: A system, comprising an optical component that, in operational use of the optical component, optically interacts with a laser beam, an electrically conductive element disposed on or within the optical component that, in operational use of the optical component, is exposed to the laser beam, and a monitoring system operative to monitor a physical quantity representative of an electrical resistance of the electrically conductive element and to determine based on the physical quantity, a position of the laser beam relative to the optical component.