公开(公告)号：US12230013B2

公开(公告)日：2025-02-18

申请号：US18365134

申请日：2023-08-03

Applicant: ASML Netherlands B.V.

Inventor： Wentian Zhou ,  Liangjiang Yu ,  Teng Wang ,  Lingling Pu ,  Wei Fang

IPC: G06T7/00 ,  G06F18/214 ,  G06V10/774 ,  G06V10/776 ,  G06V10/98

Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.

公开(公告)号：US11216938B2

公开(公告)日：2022-01-04

申请号：US16554110

申请日：2019-08-28

Applicant: ASML Netherlands B.V.

Inventor： Lingling Pu ,  Wei Fang ,  Nan Zhao ,  Wentian Zhou ,  Teng Wang ,  Ming Xu

IPC: G06T7/00 ,  G06T7/60 ,  H01L21/66

Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.

公开(公告)号：US11769317B2

公开(公告)日：2023-09-26

申请号：US16718706

申请日：2019-12-18

Applicant: ASML Netherlands B.V.

Inventor： Wentian Zhou ,  Liangjiang Yu ,  Teng Wang ,  Lingling Pu ,  Wei Fang

IPC: G06T7/00 ,  G06V10/774 ,  G06F18/214 ,  G06V10/776 ,  G06V10/98

CPC classification number: G06V10/774 ,  G06F18/214 ,  G06T7/0006 ,  G06V10/776 ,  G06V10/993 ,  G06T2207/10061 ,  G06T2207/20081 ,  G06T2207/30148

Abstract: Disclosed herein is a method of automatically obtaining training images to train a machine learning model that improves image quality. The method may comprise analyzing a plurality of patterns of data relating to a layout of a product to identify a plurality of training locations on a sample of the product to use in relation to training the machine learning model. The method may comprise obtaining a first image having a first quality for each of the plurality of training locations, and obtaining a second image having a second quality for each of the plurality of training locations, the second quality being higher than the first quality. The method may comprise using the first image and the second image to train the machine learning model.

公开(公告)号：US11756187B2

公开(公告)日：2023-09-12

申请号：US17567847

申请日：2022-01-03

Applicant: ASML Netherlands B.V.

Inventor： Lingling Pu ,  Wei Fang ,  Nan Zhao ,  Wentian Zhou ,  Teng Wang ,  Ming Xu

IPC: G06T7/00 ,  G06T7/60 ,  H01L21/66

CPC classification number: G06T7/001 ,  G06T7/60 ,  G06T2207/10061 ,  G06T2207/30148 ,  G06T2207/30168 ,  H01L22/12

Abstract: Systems and methods for optimal electron beam metrology guidance are disclosed. According to certain embodiments, the method may include receiving an acquired image of a sample, determining a set of image parameters based on an analysis of the acquired image, determining a set of model parameters based on the set of image parameters, generating a set of simulated images based on the set of model parameters. The method may further comprise performing measurement of critical dimensions on the set of simulated images and comparing critical dimension measurements with the set of model parameters to provide a set of guidance parameters based on comparison of information from the set of simulated images and the set of model parameters. The method may further comprise receiving auxiliary information associated with target parameters including critical dimension uniformity.