公开(公告)号：US20250021017A1

公开(公告)日：2025-01-16

申请号：US18704532

申请日：2022-10-12

Applicant: ASML Netherlands B.V.

Inventor： Raaja Ganapathy SUBRAMANIAN ,  Bearrach MOEST ,  Alexander Alexandrovich DANILIN ,  Rowin MEIJERINK ,  Tim Izaak Johannes GOOSSEN ,  Stanislav Markovich SHUMIACHER

IPC: G03F7/00

Abstract: A method of reducing effects of heating and/or cooling a reticle in a lithographic process includes conditioning the reticle to adjust an initial temperature of the reticle to a predetermined temperature, reducing stress in the reticle to reduce parasitic thermal effects, calibrating a reticle heating model by exposing the reticle and a non-production substrate to a dose of radiation, and processing a production substrate by exposing the reticle and a production substrate to a dose of radiation based on the reticle heating model. The method can increase calibration accuracy and speed of the reticle heating model, reduce conditioning times of the reticle, reduce stress in the reticle, avoid rework of production substrates, and increase throughput, yield, and accuracy.