Wafer Design UV Reactor
    1.
    发明申请
    Wafer Design UV Reactor 审中-公开
    晶圆设计UV反应堆

    公开(公告)号:US20160272510A1

    公开(公告)日:2016-09-22

    申请号:US14425019

    申请日:2014-12-13

    Inventor: RICHARD JOSHI

    Abstract: An UV reactor system that allows single or multiple flange-less reactors to be installed between the flanges of existing piping systems. Benefits include reduced installation space and lamp placement flexibility to improve UV treatment. Each reactor can be rotated, pre and post installation, to provide multiple positions for the radiation sources that are included in each reactor.

    Abstract translation: UV反应器系统允许在现有管道系统的法兰之间安装单个或多个无法兰的反应器。 优点包括减少安装空间和灯具布置灵活性,以改善紫外线处理。 每个反应器可以在安装前和安装后旋转,以提供包含在每个反应器中的辐射源的多个位置。

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