公开(公告)号：US20040113089A1

公开(公告)日：2004-06-17

申请号：US10248074

申请日：2002-12-16

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： Alan C. Janos ,  Betty Zhang

IPC: G01J005/02

CPC classification number: G01J1/429 ,  G11C16/18

Abstract: An apparatus and process for measuring light intensities includes the use of a probe. The probe is configured for monitoring a wavelength range from about 180 nanometers to about 270 nanometers (nm). The probe comprises a reflective and diffusive layer adapted for collecting light; a waveguide having one end in optical communication with the reflective and diffusive layer, wherein the waveguide has greater than about 50 percent transmission at wavelengths of about 180 nm to about 270 nm; a sensor probe in optical communication with the other end of the waveguide; and a filter intermediate to the waveguide and the sensor, wherein the filter is adapted to remove wavelengths greater than about 270 nm and has a percent transmission at wavelengths of about 180 nm to about 270 nm greater than about 50 percent.

Abstract translation: 用于测量光强度的装置和方法包括使用探针。 该探针配置用于监测约180纳米至约270纳米（nm）的波长范围。 探针包括适于收集光的反射和漫射层; 波导，其一端与反射和扩散层光学连通，其中波导在约180nm至约270nm的波长处具有大于约50％的透射率; 与波导的另一端光连通的传感器探头; 以及位于波导和传感器之间的滤波器，其中滤波器适于去除大于约270nm的波长并且具有大于约50％的约180nm至约270nm的波长的百分比透射率。