公开(公告)号：US20010042839A1

公开(公告)日：2001-11-22

申请号：US09772447

申请日：2001-01-29

Applicant: Advanced Energy Systems, Inc.

Inventor： Edwin G. Haas ,  Michael A. Peacock ,  Robert M. Gutowski

IPC: A61N005/00 ,  G21G005/00

CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/008

Abstract: An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).

Abstract translation: 用于光刻的发射能量系统可以包括可操作以精确对准漫射器和喷嘴的保持器组件。 根据本发明的一个实施例，保持器组件（30）可以包括联接到壳体组件（400）以固定喷嘴（22）的喷嘴安装系统（414）。 扩散器安装系统（430）可以联接到壳体组件（400）以固定扩散器（28）。 对准系统（450）可以操作以使喷嘴（22）和扩散器（28）彼此空间关系对准，以优化扩散器（28）相对于喷嘴（22）的操作。

公开(公告)号：US20020051358A1

公开(公告)日：2002-05-02

申请号：US09760340

申请日：2001-01-12

Applicant: Advanced Energy Systems, Inc.

Inventor： Edwin G. Haas ,  Robert M. Gutowski ,  Vincent S. Calia

IPC: F21V033/00

CPC classification number: H05G2/003 ,  B82Y10/00 ,  F25J2205/20 ,  G03F7/70033 ,  H05G2/006 ,  H05G2/008

Abstract: A method for providing a lithographic light source is provided that includes producing a process fluid plume. A coaxial shielding fluid is produced around the process fluid plume. A plasma is generated by providing an energy source that impinges on the process fluid plume.

Abstract translation: 提供了一种用于提供平版印刷光源的方法，其包括制造工艺流体羽流。 在工艺流体羽毛周围产生同轴屏蔽流体。 通过提供冲击过程流体羽流的能量源来产生等离子体。