公开(公告)号：US20110259522A1

公开(公告)日：2011-10-27

申请号：US13177076

申请日：2011-07-06

申请人： Akitaka MAKINO ,  Youji TAKAHASHI ,  Minoru SORAOKA ,  Hideki KIHARA ,  Susumu TAUCHI

发明人： Akitaka MAKINO ,  Youji TAKAHASHI ,  Minoru SORAOKA ,  Hideki KIHARA ,  Susumu TAUCHI

IPC分类号： C23F1/08

CPC分类号： H01L21/6719 ,  H01L21/67017 ,  Y10S414/135 ,  Y10S414/139

摘要： A vacuum processing apparatus includes a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas, and a mass flow controller unit interposed between two of the processing chambers for supplying gas to the chambers.

摘要翻译： 一种真空处理装置，包括设置在其中心的转印单元，多个处理室，每个处理室具有用于支撑待处理物体的处理台，并使用气体进行处理;以及质量流量控制单元， 用于向腔室供应气体的处理室。

公开(公告)号：US20080317581A1

公开(公告)日：2008-12-25

申请号：US12199876

申请日：2008-08-28

申请人： Akitaka MAKINO ,  Youji Takahashi ,  Minoru Soraoka ,  Hideki Kihara ,  Susumu Tauchi

发明人： Akitaka MAKINO ,  Youji Takahashi ,  Minoru Soraoka ,  Hideki Kihara ,  Susumu Tauchi

IPC分类号： H01L21/203

CPC分类号： H01L21/6719 ,  H01L21/67017 ,  Y10S414/135 ,  Y10S414/139

摘要： A vacuum processing apparatus includes an outer chamber comprising a vacuum container, an inner chamber in which a plasma used for processing a wafer is generated, the inner chamber being detachably disposed inside of the outer chamber, a wafer holder on which the wafer is located is disposed inside of the inner chamber, and an exhausting device disposed below the wafer holder which exhausts the inside of the inner chamber. The inner chamber is sealed in air-tight manner with respect to a space between the inner chamber and the outer chamber while the space is maintained at a vacuum pressure.

摘要翻译： 一种真空处理装置，其特征在于，包括真空容器的外部室，产生用于处理晶片的等离子体的内部室，可拆卸地设置在所述外部室内部的内室，所述晶片所在的晶片保持架为 并且设置在所述晶片保持器的下方排出所述内室的内部的排气装置。 相对于内室和外室之间的空间，内室以气密方式密封，同时空间保持在真空压力。