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1.发明授权Design of hardware features to facilitate arc-spray coating applications and functions 有权设计硬件功能，方便电弧喷涂应用和功能公开(公告)号：US06797131B2
公开(公告)日：2004-09-28
申请号：US10293641
申请日：2002-11-12
申请人： Alan Barry Liu , Chien-Shiung Tzou , James Tsung
发明人： Alan Barry Liu , Chien-Shiung Tzou , James Tsung
IPC分类号： C23C1434
CPC分类号： C23C14/564 , C23C4/00 , C23C4/01 , C23C4/02 , C23C14/50
摘要： A method and apparatus for forming a coating on a sputter chamber workpiece. The apparatus generally includes a sputter chamber having at least one workpiece. The at least one workpiece generally includes one or more trenches formed therein, the trenches being configured to define an arc spray coating region. The method generally includes forming one or more trenches in the workpiece, the trenches defining a coating region and applying a metal coating to the coating region by arc spraying.
摘要翻译： 一种用于在溅射室工件上形成涂层的方法和装置。 该设备通常包括具有至少一个工件的溅射室。 所述至少一个工件通常包括形成在其中的一个或多个沟槽，所述沟槽构造成限定电弧喷涂层区域。 该方法通常包括在工件中形成一个或多个沟槽，沟槽限定涂覆区域，并通过电弧喷涂将金属涂层施加到涂覆区域。
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公开(公告)号：US06506291B2
公开(公告)日：2003-01-14
申请号：US09881902
申请日：2001-06-14
IPC分类号： C23C1450
CPC分类号： H01L21/67109 , C23C14/50 , C30B25/12 , C30B31/14
摘要： A substrate support having heat transfer enhancing topography. Generally, the substrate support includes a first side that supports the substrate and a second side. A ring and a plurality of substrate support pads project from the first side. The ring is disposed proximate the perimeter of the substrate support. A fluid passage is disposed through the substrate support and is coupled to a well disposed in the first side. A plurality of gas flow channels are disposed in the first side and orientated radially outward from the well to a perimeter channel disposed radially inward and adjacent to the ring.
摘要翻译： 具有传热增强形貌的基底支架。 通常，衬底支撑件包括支撑衬底的第一侧和第二侧。 环和多个基板支撑垫从第一侧突出。 环设置在基板支撑件的周边附近。 流体通道设置穿过基板支撑件并且连接到布置在第一侧中的孔。 多个气体流动通道设置在第一侧并且从井的径向向外定向到径向向内和邻近环设置的周边通道。
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