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1.发明授权Method and system for excursion monitoring in optical lithography processes in micro device fabrication 有权微器件制造中的光刻工艺中偏移监测的方法和系统公开(公告)号：US08660681B2
公开(公告)日：2014-02-25
申请号：US13006522
申请日：2011-01-14
申请人： Andre Poock , Daniel Zschaebitz , Heike Scholtz
发明人： Andre Poock , Daniel Zschaebitz , Heike Scholtz
IPC分类号： G06F19/00
CPC分类号： G03F7/70525
摘要： A process monitoring system may detect out-of-control situations on the basis of a single criterion for a plurality of different lithography processes. To this end, each data set related to a specific type of lithography process may be processed so as to determine relative data, which may be centered around the same mean value for each of the different process types for a standard control situation.
摘要翻译： 过程监控系统可以基于多个不同光刻过程的单个标准来检测失控情况。 为此，可以处理与特定类型的光刻处理相关的每个数据集，以便确定相对数据，其可以围绕针对标准控制情况的每个不同过程类型的相同平均值居中。
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2.发明申请Method and System for Excursion Monitoring in Optical Lithography Processes in Micro Device Fabrication 有权微器件制造中光学平版印刷工艺中偏移监测的方法与系统公开(公告)号：US20120004758A1
公开(公告)日：2012-01-05
申请号：US13006522
申请日：2011-01-14
申请人： Andre Poock , Daniel Zschaebitz , Heike Scholtz
发明人： Andre Poock , Daniel Zschaebitz , Heike Scholtz
IPC分类号： G06F19/00
CPC分类号： G03F7/70525
摘要： A process monitoring system may detect out-of-control situations on the basis of a single criterion for a plurality of different lithography processes. To this end, each data set related to a specific type of lithography process may be processed so as to determine relative data, which may be centered around the same mean value for each of the different process types for a standard control situation.
摘要翻译： 过程监控系统可以基于多个不同光刻过程的单个标准来检测失控情况。 为此，可以处理与特定类型的光刻处理相关的每个数据集，以便确定相对数据，其可以围绕针对标准控制情况的每个不同过程类型的相同平均值居中。
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