Antireflective coating and method of manufacturing same
    1.
    发明授权
    Antireflective coating and method of manufacturing same 失效
    抗反射涂层及其制造方法

    公开(公告)号:US06359735B1

    公开(公告)日:2002-03-19

    申请号:US09355871

    申请日:1999-09-15

    IPC分类号: G02B111

    摘要: What is described here is an antireflective coating comprising a carrier layer consisting of an optically transparent material, which, at least on one surface side, presents antireflective properties with respect the wavelengths of the radiation incident on the surface. Moreover, methods of producing the coating are described. The invention excels itself by the provision that the antireflective surface side presents a surface roughness with stochastically distributed structures—the so-called macro structures—and that the macro structures are additionally modulated with surface structures presenting a periodic sequence—the so-called micro structures—which present period or cycle lengths smaller than the wave lengths of the radiation incident on the antireflective surface.

    摘要翻译: 这里描述的是抗反射涂层,其包括由光学透明材料组成的载体层,至少在一个表面侧上,相对于入射在表面上的辐射的波长呈现抗反射特性。 此外,描述了制造涂层的方法。本发明本身通过规定抗反射表面侧具有随机分布结构的表面粗糙度 - 所谓的宏观结构 - 并且宏观结构被附加地调制,表面结构呈现 周期性序列 - 所谓的微结构 - 其存在周期或周期长度小于入射在抗反射表面上的辐射的波长。