公开(公告)号：US20250041908A1

公开(公告)日：2025-02-06

申请号：US18781131

申请日：2024-07-23

Applicant: Applied Materials, Inc.

Inventor： Jason A. RYE ,  Alex DURADO

IPC: B08B3/04 ,  B01F23/23 ,  B01F23/232 ,  B01F25/452 ,  B08B13/00

Abstract: Embodiments herein provide a semiconductor substrate cleaning chamber. The cleaning chamber includes side walls that partially define a cleaning volume, a pedestal disposed within the side walls, and a cleaning arm disposed above the pedestal. The cleaning arm includes a nozzle assembly disposed on a nozzle end of the cleaning arm. The nozzle assembly includes a housing, and a body disposed within the housing and having a gas port disposed through the body and configured to aerate a fluid passing through the nozzle assembly.