公开(公告)号：US20250117754A1

公开(公告)日：2025-04-10

申请号：US18903907

申请日：2024-10-01

Applicant: Applied Materials, Inc.

Inventor： Ruiying Hao ,  Winston Chen ,  Jenn-Yue Wang ,  Cathy Cai ,  Weizong Xu ,  Lifan Chen ,  Balasubramanian Pranatharthiharan

IPC: G06Q10/20 ,  G06T7/00 ,  G06V10/48 ,  G06V10/88

Abstract: A method includes obtaining, by a processing device, first image data of a substrate including an epitaxial film. The method further includes applying a frequency domain filter to the first image data to obtain filtered image data. The method further includes determining a number of epitaxial defects represented in the first image data by performing feature detection on the filtered image data. The method further includes performing a corrective action in view of the number of epitaxial defects.